Research Tools for Reactive Ion Etching
Reactive ion etching delivers a highly directional flux of energetic, reactive ions to the material surface. In doing so, a precisely controlled patterning of the subsrate occurs as un-masked sample is etched away by the reactive ions. Each of our plasma systems can optionally be fitted with a reactive ion etch electrode making them a perfect, low cost laboratory development tool in applications such as semiconductor or organic electronics research.
Reactive Ion Etch electrodes with gas shower are available in the following sizes on the following machines;
Femto RIE - 80mm diameter electrode
Pico RIE - 140mm diameter electrode
Nano RIE - 220mm diameter electrode