Preparation of Nanoparticles - Recently published research in Nature Materials, by groups working at King Abdullah University of Science and Technology (KAUST), Imperial College London and the Rutherford Appleton Laboratory details advances in the development of organic semiconductor photocatalysts which could be used in solar panels to harness more of the sun’s energy than was previously possible.
The work demonstrates that incorporating a heterojunction between a donor polymer (PTB7-Th) and non-fullerene acceptor (EH-IDTBR) inorganic nanoparticles (NPs) can result in hydrogen evolution photocatalysts with greatly enhanced photocatalytic activity. The Henniker HPT-100 plasma system was used to prepare nanoparticles prior to atomic force microscopy to confirm the core-shell morphology of the deposited nanoparticle layer.
Fig 1. Henniker's small benchtop plasma cleaner range - HPT-100 (left) HPT-200 (right)
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Industry Application
Plasma cleaning is a trusted method in materials science, nanotechnology, and analytical chemistry labs to improve AFM sample quality. Clean surfaces lead to improved imaging resolution and reproducibility in nanoparticle analysis.
Keywords:
- Plasma cleaning
- Atomic force microscopy
- AFM prep
- Nanoparticle adhesion
- Surface preparation
- HPT plasma cleaner
- Microscopy sample cleaning
- HPT-100
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FAQs
Q: Why is plasma cleaning used before atomic force microscopy?
A: Plasma removes organic residues and improves nanoparticle adhesion, ensuring a stable, clean surface for high-resolution AFM scanning.
Q: What equipment is used for AFM sample plasma prep?
A: The HPT-200 Plasma System is commonly used for AFM sample preparation in research labs.
Q: Does plasma cleaning affect nanoparticles or delicate samples?
A: No - plasma cleaning is low-energy and dry, making it suitable for sensitive materials without altering their structure.
