TEM Sample Plasma Cleaning
Below, we examine the effectiveness of plasma cleaning for microscopy using a Henniker Plasma Cleaner for holey carbon grid preparation in TEM and SEM applications. This work, summarised here, was completed with our HPT-100 Plasma Cleaning System and a JEOL-compatible TEM sample holder adapter.
Method
Using the Henniker HPT-100 Plasma Cleaner, with Jeol TEM adapter, and continuously variating the power output from 0-100W and dual digital MFC gas mixing, we introduced the samples via the front feedthrough adapter. They were cleaned with Ar:O2 95:5 mixture at low power (20W and 50W) in 30sec time steps.
Industry Application
Plasma cleaning is widely adopted in electronics failure analysis, materials research, and medical device development, where microscopy clarity is critical. Clean surfaces reduce false signals and improve analytical confidence in SEM and TEM workflows.
Results & Conclusion
Results show the cleaning progression for selected thinned analysis regions illustrating controlled removal of carbon followed by gradual loss from the thicker walls. The images, included in the application note, were taken from an identical location using a TEM they display a finder holey carbon grid showing a gradual loss of carbon from a small thinned area of the grid. First, the thinned carbon was removed (or eaten away). Then the thick walls were observed to lose carbon from the edges.
In conclusion, the Henniker plasma cleaner was observed to be suitable for TEM preparation purposes because Henniker Plasma Systems offer amazing control over how much carbon is removed from sample grids. It was proven as a suitable for catalyst samples on carbon for hydrocarbon contamination cleaning in the TEM.
Read our full application note here
Our low-cost plasma cleaners/plasma ashers for TEM sample holders are designed specifically for fast and efficient cleaning.
The TEM sample plasma cleaners/plasma ashers are fully automated and come with standard adapters which are suitable for the sample holders supplied with all the major microscope manufacturers. The plasma output power is fully variable over the range 0-100W, resulting in a very controllable & gentle cleaning process. Common sources of error inside the TEM are clearly reduced with plasma cleaning and the dwell time during the measurement is significantly increased.
Tem Plasma Cleaner / Plasma Asher options:
The TEM plasma cleaner/plasma asher is an application-specific solution for low-pressure plasma cleaning and preparation of electron microscopy samples, including:
- Low power operation
- A front feed TEM sample holder
- Multiple TEM grids and SEM stub cleaning
- Re-entrant style sample holder introduction
- Dual gas inlets for O2/Ar and other gases
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FAQs
Q: Why use plasma cleaning before SEM or TEM imaging?
A: Plasma removes hydrocarbon contamination, enhancing image quality and resolution by ensuring a clean, conductive sample surface.
Q: Is plasma cleaning safe for delicate microscopy samples?
A: Yes. Plasma treatment is gentle and dry, making it ideal for cleaning fragile specimens without altering their structure.
Q: What types of contamination does plasma remove?
A: It removes organic residues such as hydrocarbons, fingerprints, and atmospheric pollutants - common in lab-prepped samples.
