Henniker specialises in advanced, compact plasma cleaners that deliver precision surface cleaning for electron microscopy applications, ensuring reduced contamination and sharper, more reliable results.
Our versatile systems are compatible with major TEM and SEM sample holders, offering fully automated control and gentle, low-power operation. Experience increased measurement stability, minimised common sources of error, and simplified sample preparation backed by robust, user-friendly technology that adapts to your research needs.
Our low-cost plasma cleaners/plasma ashers for SEM & TEM sample holders are designed specifically for fast and efficient cleaning in microscopy.
The plasma cleaner/plasma asher range for microscopy are fully automated bench-top plasma cleaners that come with standard adapters which are suitable for the sample holders supplied with all the major microscope manufacturers. The plasma output power is fully variable over the range 0-100W, resulting in a very controllable & gentle cleaning process. Common sources of error inside the microscope are clearly reduced with plasma cleaning and the dwell time during the measurement is significantly increased.
Recently published articles
A selection of recently published articles where the Henniker HPT systems are used for TEM sample preparation can be accessed from the following links:
- Influence of electrode processing and electrolyte composition on multiwall carbon nanotube negative electrodes for sodium ion batteries
- Nano-devitrification and structural evolution of amorphous state in surface Ti-Ta-based alloy fabricated on TiNi substrate through additive thin-film electron-beam synthesis
- Evaluation of correlated studies using liquid cell and cryo-transmission electron microscopy: Hydration of calcium sulphate and the phase transformation pathways of bassanite to gypsum
- Energy-efficient resistive switching synaptic devices based on patterned Ag nanotriangles with tunable gaps fabricated using plasma-assisted nanosphere lithography
- TEM study of bubble formation in Ti–Ta–Si–Ni metallic glass surface alloy on TiNi SMA substrate during additive thin-film electron-beam synthesis
- Enhanced photocatalytic hydrogen evolution from organic semiconductor heterojunction nanoparticles
- Submicrostructure and Characteristics of the Short-Range Atomic Order in an Amorphous Ti–Ni–Ta–Zr-Based Surface Alloy Formed on a TiNi Substrate by the Electron-Beam Method
- Case study of freezing-induced loading of silver nanoparticles into vaterite microcrystals
- Influence of Jewelry Surface Vibromechanical Processing on the Structure and Mechanical Properties of TiNi Alloy
- Microscopic crystallographic analysis of dislocations in molecular crystals
- Plasma-Treated CsPbBr3 Nanocrystal Films for Anticounterfeiting Applications
- Phase-Change Microcapsules with a Stable Polyurethane Shell through the Direct Crosslinking of Cellulose Nanocrystals with Polyisocyanate at the Oil/Water Interface of Pickering Emulsion
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Videos
Plasma Cleaning Explained
Plasma Cleaning Explained.
The third in our series of videos about plasma treatment technology, this video explains how plasma cleaning works and which systems can provide the best quality treatments.